Ionic bundle multilayer velar preparation technology and application

0 μ M. (2) equipment is sophisticated. Basically include vacuum system, rotate target room, ionic source and high pressure are quickened, scanning of analysis, deflexion, complex treatment parameter testing system and full automatic the computer controls a system, facility cost is accordingly high. (3) technology difficulty is great, the technical issue that it involves is complex, be like ionic collision and energy loss problem. (4) is splashed as a result of ionic surface shoot effect, make heavier ionic infuse gets Gao Nong spends adulteration very hard. This shows, other technology cannot get ionic infuse has a lot of advantages, because of this technology just develop a school of one's own, obtained a lot of fundamental application positive result. But ionic infuse place causes filmy modified layer thin, limitted the development of this kind of technology, because this takes ionic infuse,can accuse accurately and deposit technology is attainable the advantage of thick modified layer, accumulate photograph union to improve film and matrix agglutinate character with ionic infuse and ionic Shu Chen, the structure that changes deposit film, composition and the density that increase deposit film, will improve the quality of deposit film, and can get ply counts the craft film of micron. 3, ionic infuse transfers the preparation of layer and gradient film 1. Ionic infuse surface is cleaned with transfer layer preparation mixes all sorts of exceeding in deposit metal when putamen, because heat up the difference of coefficient of expansion, often pass because of interfacial stress big and the desquamation that causes film, because this cannot get deep film. The biggest obstacle of deposit film and matrix agglutinate is clean degree of the surface, handle method purify oil and the pollution of all sorts of organic matter with strict cleanness above all, next reoccupy is ionic A of bundle of adsorption layer of bombard purify carbon and B of matrix autoxidation layer, when infuse the quantity is 3 × 1016/cm² , exterior carbon adsorption layer and autoxidation layer still did not get rid of, till 6 × 1016/cm² when, layer of B of mouth of ability purify A. Increase infuse quantity to be able to form D of the layer that do not have foreword and Ti-Fe solid solution layer inside matrix again, if pursue,1 is shown. Before graph 1a is infuse (among them A is carbolic adsorption layer, b is autoxidation layer) ; Graph 1b is Ti infuse (3 × 1016/cm²) ; Graph 1c is infuse of 6 × 1016/cm² (A and B layer already purify) ; Graph 1d is prep above infuse of 6 × 1016/cm² . Formed Ti chroma delay to change in the surface so a C, if be in film of Ti of deposit of infuse layer surface, can appear hot coefficient of expansion changes to velar delay from matrix layer, the result reduced the interfacial stress of film and matrix, enhanced agglutinate power of film. The change that iron of infuse of graph 1 Ti is expressed and voice measures along with infuse 2. DLC film and other the preparation that exceeds putamen gradient layer sinks to reduce accumulate the stress between layer and matrix, one of best methods are the film in gradient of chroma of the preparation on matrix and structural gradient. Its atom structure is shown 2 times like the graph. Go up in Ti matrix first more high-energy quantity and inferior infuse measure infuse (65keV, the C of 20min) is ionic, next again inferior energy and taller infuse measure infuse (45keV, the C of 4Omin) is ionic, if pursue,the result appeared the atomic chroma of 2 distributings sketch map, c ion is used on this foundation bundle enhance deposit (splash shoot energy to be 10 ～ 15keV, 30min) deposit diamond film, use film of DLC of groovy law deposit finally, its atom distributings see a picture 2. From the graph 2 visible, do not have occurrence bound and. Arrive from matrix in light of exterior direction, ti atomic chroma drops from 100 ％ 0, and C atomic chroma from 0 increase 100 ％ , hot coefficient of expansion drops, result thermal stress gets releasing. Its structure is Ti-(Ti+C, ti)-TiC-(Ti+C+C)-C. Graph distributinging graph of C of 2 gradient layer and Ti atom 3. The improvement of agglutinate character does not have an interface as a result of DLC film and Ti alloy, the stress that makes DLC film institute is caused thereby got releasing, the result makes the adhesion of DLC film got buildup. Nick experiment makes clear, agglutinate force of film achieves 4KG, stick join forces than deposit film 2 ～ 3kg is tall. 4. In stainless steel infuse aluminium is below aerobic atmosphere below aerobic atmosphere, aluminous infuse stainless steel, infuse quantity is 4.

5 × 1017/cm² , appearance of peak value chroma is 42 ％ . As a result of the existence of oxygen, the aluminium of infuse built Al2O3 layer in stainless steel surface. When infuse quantity is as high as 9 × 1018/cm² , al atomic chroma still can achieve 100 ％ . It is it is thus clear that in steel Al atomic chroma is from 0 increase 100 ％ , aluminous layer ply can achieve 500nm, formed typical gradient layer, have very tall fight corrode character. Measure a result to make clear, only the oxygen content of 5 ％ appears in infuse layer. If increase oxygen flow appropriately in the later period of infuse, can form Al2O3 layer in steel surface, form stainless steel thereby - stainless steel + Al-Al-A12O3 layer structure, can increase the hear resistance of steel. 4, multilayer preparation technology of film 1. Muti_function ionic infuse and multilayer the structure of machine of infuse of ion of source of arc of United States of velar deposit facility (the structure of 3) seeing a picture and Russia is similar, call TAMEK ionic source, arc shedding is 10 ～ 100kA, pulse width is 1 ～ 10 " S, ion shedding can achieve 1 ～ 5kA, bundle shed density to be able to achieve 1 ～ 100A/cm² , work below 100V voltage, deposit rate can achieve 50 ～ 200nm/min, as ionic infuse, working hours > 100h, use at ion bundle enhance deposit (IBAD) , working hours can work energetically 6h. Use this kind of ionic source, use dc or pulse means to quicken, the ion after quickening bundle spot diameter can achieve 50cm, ≤ of infuse rate DD/dt 10 " Cm²/min. D and T are infuse quantity and infuse time respectively. Use this kind of equipment to be able to undertake ionic infuse (HDI) , ionic Shu Chen is accumulated and all-around ionic infuse. Put sources of a few this kind of ion room of a big vacuum all around, deposit has below 100V voltage, bring to bear on on workpiece pulse voltage formed high power to leave grant infuse (IPIB) ; Quicken pulse voltage to fall to work in hundreds of bend over from 100kV, at this moment source of arc source ion forms ion bundle enhance deposit (IBAD) . Graph source of infuse of ion of 3 arc source and ion bundle enhance deposit (IBAD) and all-around ionic infuse machine 2. Multilayer the element of Lv of velar preparation take an examination should build character exceedingly good multilayer film must want to consider the following main factor: Dimension of the sort of the photograph, grain, chemical composition and filmy ply. The sort of the photograph and the dimension that taste bead has main effect to filmy hardness; Through adjusting chemistry composition can enhance the stability of filmy structure; The reasonable collocation of grain dimension and filmy ply can make multilayer transmission of micro-crack of velar physical characteristic, control and hardness get rising. Dimension of the sort of the photograph, grain and chemical composition all can pass infuse ion of sort and pulse bias voltage change and gain effective control, because this is ionic bundle enhancing deposit is to get multilayer important step of film. (The changes ① to be able to use different part cathode of 1) filmy composition is alternant and deposit, those who get different part is multilayer film. Be like Ti(C of 3 yuan of solid solution, the composition of N) changeable C gets multilayer film, be in (Ti, on Al)N film, can add the content of Al or the content that reduce Al, or will change N atomic class status through changing N atmospheric pressure, those who form different composition gradient is multilayer film. ② changes N atmospheric pressure to be able to appear when deposit polyphase composition. If use Cr cathode to connect N2 gas, can form Cr2N+CrN deposit photograph; N2 gas is connected in Ti and Cr cathode, can get (Ti, cr)N+(Ti, cr)2N; Also can use multi-element cathode deposit, and get multivariate. Use ionic infuse to also can get 3 yuan of looks, 3 yuan of solid solution were fashioned in if use Zr, Al, Cr and C infuse TiN,getting these ion put TiN, these methods all can improve the physical characteristic of film and chemical character apparently. (2) adjusts filmy stress to pass ion bundle treatment can adjust filmy stress, filmy stress is in normally 1 ～ 10GPa. The structure that the reason that forms filmy stress grows for the size of grain dimension, film and blemish density, the filmy blemish density that grows below inferior temperature is high and taste bead small, preferential strange long way is (111) , stress is accordingly tall. Higher temperature deposit is relatively so advantageous. (3) changes a structure. Closely related structural change and composition and photograph sort. A lot of methods can use change structure, be opposite only here to table a proposal of arc source deposit: ① changes cathode class status. ② has alternant deposit with the cathode of 2 above. Of ③ different gas introduce, wait like C, N, O and Ar, also can change aeriform pressure. ④ changes matrix deposit condition, like target lukewarm, bias voltage, pulse works condition and deposit rate. 3. Multilayer the hardness that film improves WC-Co matrix character to exceed putamen asks to exceed 40GPa, only the hardness of diamond film and cubic BN film exceeds this value, but of the oxygen below diamond high temperature erode and react easily with nonferrous metal, and the scope of application that restricted diamond film; Cubic BN film is in steel solubility is small, having low oxidation rate, but difficulty of film of BN of synthetic cubic metre is very great. TiN film / AlN film, TiN/NbN, TiN/VN, TiN/VxNbyN and WC/TiN multilayer film can be passed adjust elemental content and filmy ply to get good character. (1)TiN film / AlN film is splashed with radio frequency in nitrogen atmosphere shoot Ti and Al target to be able to form TiN film alternately / of AlN film multilayer film. The film that if the metal is aluminous,content forms when more than 50 ％ is film of double deck of metallic rich market. Splash discharge of the N2 when shooting for 4.

2sccm, and Ar discharge is 25sccm, atmospheric pressure is 1.

3Pa. Filmy and deposit total ply is 2 μ M. The hardness of deposit film is highest for 2000HV, the agglutinate force of film and matrix WC is highest and OK achieve 125N. The result makes clear: ① follows the fall of ply of film of double deck of metallic rich market, filmy critical load increases, the adhesion that shows film increases, it is highest and OK that its combine strength achieve 152N. ② filmy hardness is gotten higher than WC matrix much, hardness is 18 ～ 23GPa. ③ hits an impress in sclerometer with 50N load, impress all around did not appear crackle, force has the binding energy that shows film rise apparently. (2)(Ti, a1)N film and (Ti, al, deposit of Ti of Si)N film deposit, Al can be formed to WC-Co matrix (Ti, al, si)N film [Al+Si content is less than or be equal to 0.

5] and (Al, ti, si)N film [O of Al+Si content prep above.

5] , (Ti, al, the hardness of Si)N film can be as high as 29GPa, when (Al+Si)/(Al+Ti+Si)=O.

When 58l, (Al, ti, the hardness of Si)N film is highest and OK achieve 34GPa, having very fine column shape structure. Its development and application prolonged the life of the tool greatly, and realized high-speed machining, also improved fight character of high temperature oxidation, working temperature achieves 800 ℃ to still can go up normally. It can apply at head of deposit milling cutter, improve the treatment of material of high speed horniness thereby. With arc source ion plating has deposit, velar ply is 4 ～ 5 μ M. Right (Al, ti, si)N film deposit to WC-Co matrix fight wear away characteristic and best, its wear extent is only respectively (Ti, al)N film and (Ti, al, 0 of Si)N film.

43 with 0.

7 times. (3)CrAlN and CrVN hard alloy consider to make clear recently, crN film compares TiN film coefficient of friction is lower, hardness and tenacity are taller, and can get very deep film with deposit law (> 10 μ M) . CrN, CrAlN and CrVN film are to use cathode arc ion of plating deposit. Below the circumstance of oily embellish, the coefficient of friction of CrN and CrAlN film is 0.

1, and the coefficient of friction of CrVN film is 0.

02. CrAlN film wears away relatively serious, it is CrN film next, crVN film wear extent is the smallest. CrVN film wear extent is the 1/22 of CrAlN and CrN and 1/17 respectively. (4)B-C-N accept rice is multilayer velar deposit exceeds hard data is the 4200HV of hardness prep above that points to material. Covalent bond or covalent bond prevail and combine the structural data with short key, the likelihood undertakes exceeding sclerotic modified to material, for instance the B-C-N structure of cubic structure, use ionic infuse method, increase 325eV from 25ev along with ionic energy, hardness increases 42GPa from 15GPa, the stretch model quantity of material increases 230GPa from 145GPa. Cubic BN is accompanying strong ion when deposit bundle bombard, can get this kind exceeds putamen, but the internal stress that defect is film is exorbitant, the ply of deposit film gets thick film impossibly (> 100nm) and the use that affected it. It is however when deposit BN film, element of the C that add a person can make stress gets releasing, introduce multilayer velar technology, can get lower stress 0.

5GPa, the thick film of better agglutinate character (critical and laden value all maintains in 50 ～ 60N) , and coefficient of friction is inferior. Normal Align=center> graph is multilayer structural Normal Align=center>(a)WC ―.

65Al0.

35N (b)WC-Ti0.

43Al0.

Rice of 57N (5)WC-Ti(1-X)AlXN accept is multilayer film of rice of accept of WC-Ti(1-X)AlXN of broach of velar deposit PCB is a kind of character is exceedingly good exceed putamen, its structure is in graph 4 on express, the structure of the content film of different Ti and Al has clear distinction. From X ray diffraction the graph looks, diffractive annulus distributings for clear lattice, this makes clear multilayer velar structure exceeds crystal lattice structure for accept rice. This kind of film has very tall hardness, closely related WC-Ti(1-X)AlXN film hardness and Al atomic content, along with the addition of power density and Al atomic content, filmy hardness increases, highest achieve 50GPa, and filmy stress keeps changeless, have very good agglutinate character, improved the service life of PCB broach successfully. Rice of deposit WC-Ti(1-X)AlXN accept is multilayer the result that PCB broach of film machines circuit board makes clear, deposit film (ply of 1 μ M) broach machines Kong Shu to compare not deposit PCB bit amount 1 times more. Carry an observation of scanning electron microscope on the head to make clear from the broach after treatment, the broach of not deposit film, after machining 6000 aperture, cut becomes blunt, mouth of mouth of pliable but strong has Cu bit adhesion, deposit WCTi0.

43Al0.

The PCB broach of 57N, the film after machining 9000 aperture falls off, blade still keeps sharp, can machine 12000 empty aperture. 4.

Multilayer character of DLC film deposit because kind diamond film has very tall hardness, chemical laziness, particularly tall thermal conductance and resistor are led, because this kind of film been havinging a lot of application on industry, for instance machinist job is fought wear away, the assembly in electronic industry, passivation and medicinal powder heat. This kind of film belongs to brittleness film, have very tall compression stress, in use often causes tall stress film film bends, generation meet an emergency, film and matrix agglutinate force are reduced, bring about filmy invalidation thereby. To increase the agglutinate power of film and matrix, deposit between DLC film and matrix a resilient coating, OK and apparent land enhances the agglutinate power of film and matrix. Best buildup the order of film and resilient coating of matrix agglutinate force is Ti, TiN, TiCN, TiC and DLC. Through changing bias voltage of reaction gas discharge, matrix and current density, can change filmy class status, get flowing interface thereby. (1)Ti, TiN, TiCN, TiC and DLC are multilayer velar deposit accuses to splash ejaculation method to have filmy deposit with magnetism, 4 measure before deposit all use Ti negative pole (99.

5 ％ ) , the diameter is 20cm, matrix is AISl420 steel, hardness is 6.

256GPa. Target room atmospheric pressure is achieved 1.

5 × 10-4Pa, working atmospheric pressure is (2.

0 ～ 3.

2) × 10-1Pa, the target when deposit is lukewarm for 300 ℃ . Should change tall pure nitrogen only (99.

99 ％ ) the discharge with methane, can realize Ti, TiN, TiCN, TiC and DLC multilayer velar deposit. The discharge of the nitrogen in deposit process and firedamp is 80 ％ of 0 ～ and 23 ％ ～ respectively 0; And connect with corresponding discharge high pure argon is angry (purity 99.

99 ％ ) . Use 3 kinds of deposit means: Step up of ① firedamp discharge: 30 ％ , 40 ％ , 50 ％ , 60 ％ , 70 ％ and 80 ％ . ② changes bias voltage: O ～ - 300V. ③ changes matrix current density: 1.

02 ～ 3.

OmA/cm2, filmy total ply is 2.

5 μ M. Along with the addition of methane discharge exterior hardness increases gradually, the maximum of hardness is 41.

3GPa. Ionic bombard is helpful for film growing, filmy remaining stress and infuse condition are relevant, below appropriate condition, its are worth but low to 2 ～ 3GPa. (2) is multilayer DLC/Cr film character is had as a result of DLC deposit film very low coefficient of friction and fight admirably wear away characteristic, got in industrial application extensive attention. Although DLC film has aforementioned advantage, but DLC film has very tall compression stress and brittleness, because this affected its applied range. To solve this one difficult problem, when deposit DLC film, mix into is entered a few Cr, Ta, W and Ti, improve DLC film character effectively. Use especially multilayer C/Cr film can get wonderful agglutinate character, adhesive strength is OK > 70N. Accuse to splash with magnetism shoot and deposit method comes to much arc ion deposit C/Cr is multilayer film, mix by cathode of 3 black lead in deposit system composition of cathode of a Cr. To enhance the agglutinate of film and matrix, use Cr ionic shell first, so that purify surface pollutes a layer, cr cathode arc flows for 100A, matrix bias voltage is 1200V; Be opposite to reduce filmy stress the action of matrix, need deposit CrN film, when deposit, connect the gas mixture of Ar+N, matrix bias voltage is - 80V, the ply of deposit CrN film is O.

25 μ M. Deposit chooses different matrix bias voltage: - 65V, - 75V and - 95V, in all deposit 4h, the ply that gets deposit film is 1.

6 μ M. Field current of the cathode when deposit is 5A. It is when negative bias - 65v and - when 95V, coefficient of friction is respectively 0.

21 with 0.

16, because the surface roughness of film of deposit of tall bias voltage is small,this is, the surface is flowing, columnar structural size is small, what the union between column causes cheek by jowl. Measure with nick appearance make clear, the critical load that uncovers deposit film is more than 70N, this reflected the effect of resilient coating and accept rice structure adequately. (3)DLC+TiC and A1+Si are multilayer velar character uses source of 2 vacuum arc and alignment of 2 magnetism filter to be in same on matrix, the bent housing of filter bends for 90 ° horn, through at the same time or early or late deposit will realize multi-element multilayer the deposit of complex structure of film. The ion in relying on the pulse on matrix to lose bias voltage to quicken plasma makes matrix appearance, reactive and previous deposit arrives exterior atom, form reactive infuse, each pulse process is the procedure that notes person and reactive infuse directly. Will change deepness of surface of infuse ion pH indicator to distributing with this kind of method, the cannon-shot of infuse is OK lengthen, the interfacial position of film and matrix and filmy structure also with ionic energy closely related. Part on matrix deposit Al+Si and TiC film, after that deposit DLC is multilayer film. The critical load that uncovers a film is 20 ～ 70N, after anneal (1100 ℃ , 2h) part bleb disappears, agglutinate force adds. (4) " hard " and " soft " multilayer DLC film character because DLC film internal stress is very tall, accordingly cannot the film with larger than 50nm deposit. To reduce the stress of deposit DLC film, so that win deep DLC film, formulate method of a kind of new DLC film deposit, namely alternant deposit " hard " and " soft " multilayer DLC film. Closely related the hardness that film discovers in the experiment, density and coefficient of friction and deposit and ionic energy, the DLC film that differs through changing deposit energy to be able to get these parameter. With film of DLC of 2keV energy deposit, hardness is tall (60GPa) , density is big (3.

Sp3 of Og/cm3) , diamond key is tall (> 80 ％ ) with coefficient of friction low, call " hard " film; With 100 ～ - the film of deposit of 200ev bias voltage is " soft " film, hardness is low (23GPa) , density is low (2.

Sp3 of 1g/cm3) , diamond key is low (39 ％ ) with coefficient of friction taller. Deposit equipment uses arc source and the magnetism filter that have 90 ° deflexion, what electrode is ψ 6mm is high pure black lead, columnar positive pole, the pulse width of pulse arc source is 5ms, frequency is 2Hz, arc shedding is 300A. Use - 100V and - 2kV bias voltage is alternant deposit putamen and soft film. The rigidity that demonstrates soft film of monolayer putamen and monolayer as a result is 40GPa and 23GPa respectively, and be in multilayer in DLC film, when soft layer ply is 10 ％ , the hardness of velar hardness and monolayer putamen is equal, along with the addition of soft photograph composition, hardness drops, compress stress to also drop apparently at the same time, when soft photograph composition is 90 ％ , hardness is 26GPa, and compress stress to drop 0.

8GPa. The ply of monolayer DLC film can achieve 40nm only, and multilayer the ply of DLC film can accomplish 300nm thick. The Pan Yi that use a needle is measured coefficient of friction and fight wear away characteristic, coefficient of friction is in 0.

08 ～ 0.

15 between. In light load (O.

The wear extent below 8N) is 2 × 10-9mm3 only.

N-1.

M-1, and high load (the wear rate below 3N) rises somewhat, when soft photograph is 50 ％ , wear rate lowest arrives 2.

5 × 10-8mm3.

N-1.

M-1. Those who contain soft hard look is multilayer DLC film is fought wear away character comparing contains film of hydrogenous DLC film, the DLC that do not have foreword, TiC film, CrN film and Ti(B, the wear rate of N) film is low much. (The way DLC film that 5) enhances DLC film and matrix agglutinate power and the key that matrix combines are to make the resilient coating between fine film and matrix. The production of the resilient coating that publishs at present has Si, Ti, TiC, TiN, TiCN, Mo, Cu/Cr to wait. Si Ala of American the name of a river in Shaanxi and Henan provinces studies the result put forward to raise the method of DLC film and matrix agglutinate force before the person basis such as the Walter of lab of Home Mo Siguo, basically be to use technology of infuse of plasma source ion. Studies plan deposit measure is 4 paces: ① Ar+ is splashed shoot clean, use the oxide of purify matrix surface and other contaminant. ② undertakes C+ infuse in methane atmosphere, form layer of gradient of carbolic atom chroma, enhance the agglutinate action of DLC film and matrix thereby. ③ Ar+ is splashed shoot clean, in using purify infuse process, neuter carbolic atom is in exterior deposit, because this kind of deposit layer forms black lead film easily, the result reduced the combinative effect of deposit film and matrix. Film of ④ deposit DLC. The design gives 3 kinds of plan, the main difference of plan Ⅲ and Ⅰ depends on C+ infuse bias voltage taller (50kv) , the infuse of more high-energy quantity can get layer of thicker gradient of carbolic atom chroma. Experiment Ⅱ is splashed without C+ infuse and the 2nd Ar+ shoot clean. Use film of afore-mentioned DLC of deposit of program of 3 kinds of tests to all sorts of metals, can get the matrix of very good agglutinate has 15 to plant. Plan Ⅱ and Ⅲ have each 10 as good as effect of agglutinate of 11 kinds of matrix. It is good that plan Ⅰ has effect of agglutinate of 8 kinds of matrixes. Matrix of plan Ⅰ titanium and DLC film cannot agglutinate, make clear splash shoot clean and energy is inferior (the PS Ⅱ infuse of 20kV) , can't form agglutinate place to need the gradient interface layer of ply; Plan Ⅱ and Ⅲ and DLC film cannot the matrix of agglutinate is respectively: Copper, brass and nickel; Plan Ⅲ and DLC film cannot the matrix of agglutinate is respectively: Copper and A36 steel. Program of afore-mentioned 3 kinds of tests gave out DLC film and matrix can be very good agglutinate or not the matrix of agglutinate. (Deposit DLC is multilayer on 6) stainless steel film is used all-around ionic infuse (PS Ⅱ ) technical deposit and magnetism accuse to splash shoot technical photograph union to come deposit N/TiN/Ti(N, c) ／ DLC is multilayer film, matrix is 304 stainless steel, exterior surface roughness is 0.

1 μ of 1 ～ M, supersonic in acetone go oily, the Ar ion of 2kV is splashed shoot, undertake azotic ion infuse with machine of PS Ⅱ infuse next, atmospheric pressure is 1 × 10-4Pa. Deposit is multilayer velar surface surface roughness is to use nuclear power microscope to have observation, exterior surface roughness is only 0.

732nm, coefficient of friction is the Pan Yi that use a needle undertook metrical, coefficient of friction is 0.

105. Multilayer film divides 4 paces to have deposit: Stainless steel of ① N infuse. ② deposit TiN. ③ deposit Ti(N, c) film. Film of ④ deposit DLC. Exterior hardness is measured after each pace is handled, hardness of N infuse stainless steel is 420HV only, and deposit TiN and Ti(N, after C) film, hardness raises 1200HV, after deposit DLC film, hardness exceeds 4000HV, as equal as hardness of monolayer DLC film. The change that stretch model measures trend criterion as it happens is contrary. N/TiN/Ti(N, the remaining stress of C) film and N/TiN/Ti(N, c)/DLC film close, what remaining stress compares DLC film is 2 times lower. (Aluminium of film of DLC of deposit of 7) aluminous surface has low density and high strength / weight comparing, received wide application consequently, it is especially in aviation, spaceflight and auto industry, but aluminous surface hardness is low and fight wear away the application that characteristic difference restricted it, with multilayer DLC film replaces N ionic infuse to will have better applied prospect. With ion bundle the technology has the following kinds of methods to aluminous surface modified, n ionic infuse forms AlN, after that deposit DLC film forms AlN/DLC film structure. This kind of structure because the surface is deposit DLC film, make aluminous surface is fought thereby wear away character gets rising further, there is gradient layer between C-Al however, because of this DLC film adhesive strength is poorer, increased Ti infuse after C ionic infuse then, have DLC film deposit after that, form AlN/TI/TiN/DLC film structure thereby, this kind of structure has first-rate modified effect. 2 Ti target is put in the vacuum room of 1000mm of × of 700mm × 700mm, use at magnetism to accuse to splash shoot (1kV, 2A) , arouse with radio frequency (13.

6MHz) produces plasma, this locality atmospheric pressure is 10-4Pa, magnetism accuses to splash shoot and PS Ⅱ infuse undertakes alternately. Matrix is 2024 aluminium alloy, the need before PS Ⅱ infuse undertakes in alcohol and acetone solution supersonic clean 5 ～ 10min, blow after working, the ion that use Ar splashs shoot (2kV) : 30min. Above all N infuse, after that Ti infuse, catch Ti+N in all infuse, film of deposit finally DLC. Sclerometer of the rice that use offer measured the hardness that different deepness is in, its value is highest to 21.

4GPa. Coefficient of friction follows laden addition from 0.

1 drop 0.

06. Along with laden addition wear rate follows laden addition to increase to 4 from 1 × 10-7mm3/Nm.

5 × 10-7mm3/Nm. With N infuse, Ti+N early or late infuse aluminium and Ti+N in all infuse fights wear rate photograph aluminously to compare, wear rate dropped an amount class. 5, the person such as strong physics of Ming Sike of industrial application Russia and material institute Sharkeev, arc plasma the source undertakes be transforminged appropriately, can serve as sort metallic ion source by force, build shed ionic infuse machine by force, as a result of derivative bundle flow very strong, ionic sort is much. The structure of the structure of machine of infuse of ion of American arc source and Russia is similar, call TAMEK ionic source. Because this is very easy,effect sees in industrial production. The result that industry of infuse of arc source ion applies gives out on subordinate list. Used this kind of equipment to be able to undertake ionic infuse (HDI) , ionic Shu Chen is accumulated (IBAD) and all-around ionic infuse (IPIB) . Put sources of a few this kind of ion room of a big vacuum all around, deposit has below 100V voltage, and bring to bear on on workpiece pulse voltage formed infuse of high power ion; Quicken pulse voltage to fall to be in to the job from 100kV hundreds of bend over, at this moment source of arc source ion forms ion bundle enhance deposit (IBAD) . All undertook to 3 kinds of afore-mentioned equipment industry applies field test and contrast. Can see from next watches, use 3 kinds of ion bundle equipment applies extensively already at industrial production, can break through onefold ion to handle the limitation that did not have, the adaptability in the application that produces in industry is stronger, what make new generation likely is ionic bundle of processing equipment. Since 1988, we developed Brown MEVVA source, improved the stability that this kind of source works, and remarkable result was obtained in industrial application. This kind shed metallic ion infuse by force, overcame the weak point that sheds azotic ion infuse by force further, make life of stainless steel milling cutter raised 16 times, the broach life that processes stainless steel raised 7 times, make the screw die life that processes high-speed steel raised 4 times. 6, epilogue is integrated afore-mentioned analysises can see, ionic infuse optimizes the character that other technology has to cannot be replaced when exterior layer in synthesis, received wide application thereby; Ionic bundle in establishing new craft surface project, can get those who do not have an interface optimize deposit layer, reduced the internal stress of deposit film, increased the agglutinate power of deposit film greatly thereby, film of ionic infuse sclerosis can get exceeding putamen; With ion bundle the technology can get combinative kind of firm diamond film with matrix, also other technology can not realize these. Muti_function ionic bundle of technology is the most eye-catching is synthesis multilayer film, especially multilayer accept rice is filmy, this applies the result that cannot achieve to other technology since the lieutenant general in industry of prospective surface engineering. Ionic bundle these distinctive technologies, be sure to produce bigger effect in transforming conventional technology, replace thereby be used up inefficient, high-energy bad news, high and the old conventional technology of tall pollution, build new-style green industry, main effect is being produced in national economy and national defence construction. CNC Milling